GaSonics PEP 4800DL Iridia
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Gasonics dual chamber etcher used to independently
deskin (remove a crusted layer of photoresist without
penetrating a lower layer of conventional photoresist) or
to independently remove photoresist. Tool can also be
used in a two step process: deskin a wafer and in a
second step perform a conventional as removal. The tool
operates while simultaneously producing microwave
energy and rf energy.