KLA TENCOR 8100 XP CD-SEM
The KLA 8100 XP CD SEM is designed to perform automated CD
measurements on submicron IC features reliably,
accurately, and rapidly. System accommodates 100, 125,
150, and 200 mm wafers from three cassette platforms
located at the front of the instrument with no hardware
modifications. The KLA 8100 XP advanced automation
capability allows it to operate completely unattended at
speeds up to 50 wafers per hour.

Key Features:
  •  Wafer size: 3” – 8”
  •  Throughput: up to 50 wafers/hr
  •  MAC Operating System
  •  Feature Size: < 30 nm
  •  Resolution: < 4 nm
  •  Electron Source: Schottky, Thermal Field Emitter
  •  Magnification: 2.34 kX - 400 kX
  •  Stage: X-Y leadscrew stage, Position Accuracy < 10 micron
  •  Accelerating Voltage: 0.4 kV - 1.5 kV
  •  3 wafer loading stations
  •  Power: 120 V - 220 VAC, 1 PH, 50/60 HZ
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